![SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - <title>Hierarchical proximity correction using CAPROX</title>]()
SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - <title>Hierarchical proximity correction using CAPROX</title>Hofmann, Ulrich; Kalus, Christian K.; Rosenbusch, Anja; Endo, Hiroyuki; Kimura, Yasuki; Endo, Akihiro; Shelden, Gilbert V.; Wiley, James N. · 1995