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Low- and high-field transport properties of modulation-doped Si/SiGe and Ge/SiGe heterostructures: Effect of phonon confinement in germanium quantum wells

Low- and high-field transport properties of modulation-doped Si/SiGe and Ge/SiGe heterostructures: Effect of phonon confinement in germanium quantum wells

Madhavi, S.; Venkataraman, V.; Sturm, J. C.; Xie, Y. H.
  • 期刊名称Physical Review B
  • 作者Madhavi, S.; Venkataraman, V.; Sturm, J. C.; Xie, Y. H.
  • 卷第61卷
  • 期第24期
  • 印刷ISSN0163-1829
  • 电子ISSN1095-3795
  • 文件大小167.32KB
  • 发表时间2000-6-15
  • DOI10.1103/PhysRevB.61.16807
  • 页码16807-16818
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