5487398 Rotary cleaning method with chemical solutions and rotary cleaning apparatus with chemical solutions1996

Contamination of detergent cleaning solutions during hospital cleaningWerry, C · 1988

Advanced Alkali Cleaning Solution for Simplification of Semiconductor Cleaning ProcessMorinaga, Hitoshi; Aoki, Masumi; Maeda, Toshiaki; Fujisue, Masaya · MRS Proceedings · 1997

Single Step Alkaline Cleaning Solution for Advanced Semiconductor CleaningBaeyens, M.; Hub, W.; Kolbesen, Bernd O.; Martin, A.R.; Mertens, Paul W. · Solid State Phenomena · 1999

Single Chemistry Cleaning Solution for Advanced Wafer CleaningVos, Rita; Doll, O.; Fester, A.; Kolbesen, Bernd O.; Lux, Marcel; Kenis, Karine; Onsia, Bart; Degendt, S.; Schellkes, E.; Hatcher, Z.; Mertens, Paul W.; Heyns, Marc M. · Solid State Phenomena · 2001

Single Chemistry Cleaning Solutions for Advanced Wafer CleaningVos, Rita; Lux, Marcel; Arnauts, Sophia; Kenis, Karine; Maes, M.; Onsia, Bart; Snow, James; Holsteyns, Frank; Vereecke, Guy; Mertens, Paul W.; Heyns, Marc M.; Doll, O.; Fester, A.; Kolbesen, Bernd O.; Hackett, T.; Hoffman, Mark · Solid State Phenomena · 2003

Influence of the Dissolved Gas in Cleaning Solution on Silicon Wafer Cleaning EfficiencyKanetaka, H.; Kujime, Toshihiko; Yazaki, H.; Kezuka, T.; Ohmi, Tadahiro · Solid State Phenomena · 1999

One-Step Cleaning Solution to Replace the Conventional RCA Two-Step Cleaning Recipe for Pregate Oxide CleaningPan, Tung Ming; Lei, Tan Fu; Chao, Tien Sheng; Liaw, Ming Chi; Ko, Fu Hsiang; Lu, Chih Peng · Journal of The Electrochemical Society · 2001

Management of stock solutionsPeter C Ashbrook; Todd A Houts · 2000

LabelingPeter C Ashbrook; Todd A Houts · 2000

Targeting chemicals for waste minimizationPeter C Ashbrook; Todd A Houts · 2000

Laboratory remodelingPeter C Ashbrook; Todd A Houts · 2000

Staff turnoverPeter C Ashbrook; Todd A Houts · 2001

Spring cleaningPeter C Ashbrook; Todd A Houts · 2001

Reproductive hazardsPeter C Ashbrook; Todd A Houts · 2001