![Electrical Properties of Ultrathin Al2O3 Films Grown by Metalorganic Chemical Vapor Deposition for Advanced Complementary Metal-oxide Semiconductor Gate Dielectric Applications]()
Electrical Properties of Ultrathin Al2O3 Films Grown by Metalorganic Chemical Vapor Deposition for Advanced Complementary Metal-oxide Semiconductor Gate Dielectric ApplicationsSkordas, Spyridon; Papadatos, Filippos; Consiglio, Steven; Eisenbraun, Eric T.; Kaloyeros, Alain E.; Gusev, Evgeni P. · Journal of Materials Research · 2005