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Properties of c-C[sub 4]F[sub 8] inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C[sub 4]F[sub 8]/O[sub 2] dischargesVasenkov, Alex V.; Li, Xi; Oehrlein, Gottlieb S.; Kushner, Mark J. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2004

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