SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Masked ion beam lithography and direct structuring on curved surfaces
Loeschner, Hans; Buschbeck, Herbert; Ecker, Martin; Horner, Christoph; Platzgummer, Elmar; Stengl, Gerhard; Zeininger, Michaela; Ruchhoeft, Paul; Wolfe, John C.; Engelstad, Roxann L.
- 作者Loeschner, Hans; Buschbeck, Herbert; Ecker, Martin; Horner, Christoph; Platzgummer, Elmar; Stengl, Gerhard; Zeininger, Michaela; Ruchhoeft, Paul; Wolfe, John C.; Engelstad, Roxann L.
- 卷第5037卷
- 印刷ISSN0277-786X
- 文件大小362.62KB
- 发表时间2003
- DOI10.1117/12.482716
- 页码156-161