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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - <title>Masked ion beam lithography and direct structuring on curved surfaces</title>

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Masked ion beam lithography and direct structuring on curved surfaces

Loeschner, Hans; Buschbeck, Herbert; Ecker, Martin; Horner, Christoph; Platzgummer, Elmar; Stengl, Gerhard; Zeininger, Michaela; Ruchhoeft, Paul; Wolfe, John C.; Engelstad, Roxann L.
  • 作者Loeschner, Hans; Buschbeck, Herbert; Ecker, Martin; Horner, Christoph; Platzgummer, Elmar; Stengl, Gerhard; Zeininger, Michaela; Ruchhoeft, Paul; Wolfe, John C.; Engelstad, Roxann L.
  • 卷第5037卷
  • 印刷ISSN0277-786X
  • 文件大小362.62KB
  • 发表时间2003
  • DOI10.1117/12.482716
  • 页码156-161
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