Novel approach to growth of precipitate-free, high-quality oxide thin films suitable for device applications
- 作者K. Endo; P. Badica; H. Sato; H. Akoh
- 卷第515卷
- 期第2期
- 印刷ISSN0040-6090
- 文件大小253.75KB
- 发表时间2006
- DOI10.1016/j.tsf.2005.12.278
- 页码493-495
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