![[ECS 212th ECS Meeting - Washington, DC (October 7 - October 12, 2007)] ECS Transactions - Achievement of Higher-k and High-Φ in Phase Controlled HfO2 Film Using Post Gate Electrode Deposition Annealing]()
[ECS 212th ECS Meeting - Washington, DC (October 7 - October 12, 2007)] ECS Transactions - Achievement of Higher-k and High-Φ in Phase Controlled HfO2 Film Using Post Gate Electrode Deposition AnnealingWatanabe, Yukimune; Ota, Hiroyuki; Migita, Shinji; Kamimuta, Yuuichi; Iwamoto, Kunihiko; Takahashi, Masashi; Ogawa, Arito; Ito, Hiromi; Nabatame, Toshihide; Toriumi, Akira · 2007