Quantitative Proteomic Profiling Reveals Differentially Regulated Proteins in Cystic Fibrosis Cells
- 期刊名称Journal of Proteome Research
- 作者Rauniyar, Navin; Gupta, Vijay; Balch, William E.; Yates, John R.
- 卷第13卷
- 期第11期
- 印刷ISSN1535-3893
- 电子ISSN1535-3907
- 文件大小987.67KB
- 发表时间2014-11-07
- DOI10.1021/pr500370g
- 页码4668-4675
Temperature dependent timing in standard cell designsTimar, Andras; Rencz, Marta · Microelectronics Journal · 2014
[IEEE 2012 13th Latin American Test Workshop - LATW - Quito, Ecuador (2012.04.10-2012.04.13)] 2012 13th Latin American Test Workshop (LATW) - Acquiring real-time heating of cells in standard cell designsTimar, Andras; Rencz, Marta · 2012
[IEEE 2011 12th Latin American Test Workshop - LATW - Beach of Porto de Galinhas, Brazil (2011.03.27-2011.03.30)] 2011 12th Latin American Test Workshop (LATW) - Studying the influence of chip temperatures on timing integrityTimar, Andras; Rencz, Marta · 2011
[IEEE 2012 IEEE/CPMT 28th Semiconductor Thermal Measurement & Management Symposium (SEMI-THERM) - San Jose, CA, USA (2012.03.18-2012.03.22)] 2012 28th Annual IEEE Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM) - New simulation approaches supporting temperature-aware design of digital ICsNagy, Gergely; Timar, Andras; Szalai, Albin; Rencz, Marta; Poppe, Andras · 2012
[IEEE 2007 IEEE Design and Diagnostics of Electronic Circuits and Systems - Krakow, Poland (2007.04.11-2007.04.13)] 2007 IEEE Design and Diagnostics of Electronic Circuits and Systems - Design issues of a low frequency low-pass filter for medical applications using CMOS technologyTimar, Andras; Rencz, Marta · 2007
[IEEE 2013 19th International Workshop on Thermal Investigations of ICs and Systems (THERMINIC) - Berlin, Germany (2013.09.25-2013.09.27)] 19th International Workshop on Thermal Investigations of ICs and Systems (THERMINIC) - Logi-thermal simulation using high-resolution temperature dependent delay modelsTimar, Andras; Rencz, Marta · 2013
Proximity effect correction for nanolithographyRau, Richard · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1996
Lithography with 157 nm lasersBloomstein, T. M. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1997
X-ray lithographyHeuberger, A. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1988
Resolution limits of optical lithographyOkazaki, Shinji · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1991
Editorial boardMicroelectronics Journal · 2013
Timing characterization and constraining toolAmrozik, Piotr; Napieralski, Andrzej · Microelectronics Journal · 2014
Editorial boardMicroelectronics Journal · 2013
Editorial boardMicroelectronics Journal · 2013