![SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Increased throughput, determined by a suite of benchmark patterns, in a Gaussian electron-beam lithography tool with a 100 MHz writing rate]()
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Increased throughput, determined by a suite of benchmark patterns, in a Gaussian electron-beam lithography tool with a 100 MHz writing rateResnick, Douglas J.; Bencher, Christopher; Smith, James H.; Crosland, Nigel; Doran, Samuel; Dowling, Robert C.; Hartley, John G.; Hoyle, Philip C.; King, David M. P.; Kutcher, Lawrence; McClelland, Andrew; Turnidge, Martin · 2014