![Feature-scale model of Si etching in SF[sub 6]∕O[sub 2] plasma and comparison with experiments]()
Feature-scale model of Si etching in SF[sub 6]∕O[sub 2] plasma and comparison with experimentsBelen, Rodolfo Jun; Gomez, Sergi; Cooperberg, David; Kiehlbauch, Mark; Aydil, Eray S. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2005