![[IEEE 2014 Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2014.6.8-2014.6.9)] 2014 Silicon Nanoelectronics Workshop (SNW) - Kinetic model for scavenging of SiO<inf>2</inf> interface layer in HfO<inf>2</inf> gate stacks]()
[IEEE 2014 Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2014.6.8-2014.6.9)] 2014 Silicon Nanoelectronics Workshop (SNW) - Kinetic model for scavenging of SiO<inf>2</inf> interface layer in HfO<inf>2</inf> gate stacksLi, Xiuyan; Yajima, Takeaki; Nishimura, Tomonori; Nagashio, Kosuke; Toriumi, Akira · 2014