![Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope]()
Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet MicroscopeAmano, Tsuyoshi; Iida, Susumu; Hirano, Ryoichi; Terasawa, Tsuneo; Watanabe, Hidehiro; Yamasoe, Kenjiro; Toyoda, Mitsunori; Tokimasa, Akifumi; Harada, Tetsuo; Watanabe, Takeo; Kinoshita, Hiroo · Applied Physics Express · 2013