Computer Analysis of Sequence Data ||
- 作者Griffin, Annette M.; Griffin, Hugh G.
- 文件大小22299.08KB
- 发表时间1994
- DOI10.1385/0896032760
Challenges in Development of Sub-10 nm Resist MaterialsKozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro · Journal of Photopolymer Science and Technology · 2016
Quencher Effects at 22 nm Pattern Formation in Chemically Amplified ResistsKozawa, Takahiro; Tagawa, Seiichi; Santillan, Julius Joseph; Itani, Toshiro · Japanese Journal of Applied Physics · 2008
Pulse radiolysis of methacrylic acid ligand for zirconia nanoparticle resistYamada, Teppei; Ishihara, Satoshi; Muroya, Yusa; Santillan, Julius Joseph; Yamashita, Shinichi; Itani, Toshiro; Kozawa, Takahiro · Japanese Journal of Applied Physics · 2019
Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm FabricationKozawa, Takahiro; Tagawa, Seiichi; Santillan, Julius Joseph; Toriumi, Minoru; Itani, Toshiro · Japanese Journal of Applied Physics · 2008
Quencher diffusion in chemically amplified poly(4-hydroxystyrene- <i>co</i> - <i>t</i> -butyl methacrylate) resistKozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro · Japanese Journal of Applied Physics · 2015
Dependence of Dissolution Point on Pattern Size of Chemically Amplified Extreme Ultraviolet ResistKozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro · Japanese Journal of Applied Physics · 2012
Effects of effective reaction radius for neutralization on performance of chemically amplified resistsKozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro · Japanese Journal of Applied Physics · 2014
Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resistsKozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro · Japanese Journal of Applied Physics · 2014
Fluorinated Polyimides for Optical Applications.Matsuura, Tohru · Journal of Photopolymer Science and Technology · 1997
Amorphous chalcogenide inorganic resist.YOSHIKAWA, AKIRA · Journal of Photopolymer Science and Technology · 1994
Photopolymerizable Polyfunctional Methacrylated Polyesters.Huang, Hong; Zhang, Jiongzheng; Shi, Wenfang · Journal of Photopolymer Science and Technology · 1997
Synthesis of Photosensitive Polycarbodiimide.Mochizuki, Amane; Takeshi, Kazumasa; Haba, Osamu; Kato, Sadao; Ueda, Mitsuru · Journal of Photopolymer Science and Technology · 1998
Optical Properties of Polyalicyclic Polyimides.Matsumoto, Toshihiko; Feger, Claudius · Journal of Photopolymer Science and Technology · 1998
Plasma Polymerization of Heteroaromatic Compounds.Iriyama, Yu · Journal of Photopolymer Science and Technology · 2001
Organic Solid-State Laser.Taniguchi, Yoshio · Journal of Photopolymer Science and Technology · 2002
Investigation of Organic PhotoconductorsKuwahara, Atsushi; Naka, Shigeki; Okada, Hiroyuki · Journal of Photopolymer Science and Technology · 2007