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Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsSigmund, Peter · Physical Review · 1969

Sputtering Materials for VLSI and Thin Film Devices || Sputtering Target ManufacturingSarkar, Jaydeep · 2014

Effect of sputtering target's grain size on the sputtering yield, particle size and coercivity (Hc) of Ni and Ni20Al thin filmsReza, M; Sajuri, Z; Yunas, J; Syarif, J · IOP Conference Series: Materials Science and Engineering · 2016

Evolution of sputtering target surface composition in reactive high power impulse magnetron sputteringKubart, T.; Aijaz, A. · Journal of Applied Physics · 2017

Oxidation on Target Surface in RF Sputtering of Iron TargetsOhta, S.; Terada, A. · 1987

Sputtering Materials for VLSI and Thin Film Devices || Performance of Sputtering Targets and ProductivitySarkar, Jaydeep · 2014

Influence of manufacturing process of indium tin oxide sputtering targets on sputtering behaviorB.L. Gehman; S. Jonsson; T. Rudolph; M. Scherer; M. Weigert; R. Werner · 1992

Sulfamate nickel plating processesMetal Finishing · 1997

Electroless nickel plating solutionsMetal Finishing · 2004

Electroless nickel platingMetal Finishing · 2000

Anodizing of aluminumGrubbs, Charles A. · Metal Finishing · 2007

Aqueous acrylic epoxy microgelsMetal Finishing · 1997

Ultrasonic parts cleanerMetal Finishing · 2001

Plastic media blastingNudelman, Alan K.; Abbott, Kenneth · Metal Finishing · 2000

Noncyanide copper-zinc electroplating bathMetal Finishing · 1997