![Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WN
<sub/><i>x</i>
</sub>
Gate Formation]()
Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WN
<sub/><i>x</i>
</sub>
Gate FormationMoriwaki, Masaru; Yamada, Takayuki; Harada, Yoshinao; Fujii, Shinji; Yamanaka, Michinari; Shibata, Jun; Mori, Yoshihiro · Japanese Journal of Applied Physics · 2000