![Technology and characterization of MIS structures with co-doped silicon nanocrystals (Si-NCs) embedded in hafnium oxide (HfO x ) ultra-thin layers]()
Technology and characterization of MIS structures with co-doped silicon nanocrystals (Si-NCs) embedded in hafnium oxide (HfO x ) ultra-thin layersMazurak, A.; Mroczyński, R.; Jasiński, J.; Tanous, D.; Majkusiak, B.; Kano, S.; Sugimoto, H.; Fujii, M.; Valenta, J. · Microelectronic Engineering · 2017