Quantum Biased Oracles
- 期刊名称IPSJ Digital Courier
- 作者Iwama, Kazuo; Kawachi, Akinori; Yamashita, Shigeru
- 卷第1卷
- 电子ISSN1349-7456
- 文件大小187.79KB
- 发表时间2005
- DOI10.2197/ipsjdc.1.461
- 页码461-469
[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Implant dosimetry results for plasma dopingWalther, S.; Lenoble, D.; Ziwei Fang, ; Liebert, R.B. · 2000
[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Two implant measurement of pressure compensation factorsHalling, M. · 2000
[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Implant dosimetry results for plasma dopingWalther, S.; Lenoble, D.; Ziwei Fang, ; Liebert, R.B. · 2000
[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Junction capacitance reduction by S/D junction compensation implantCurello, C.; Rengarajan, R.; Faul, J.; Kieslich, A.; Glawischnig, H. · 2000
[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - How to monitor a sub-keV USJ implantBayha, B.; Loeffelmacher, D.; Lerch, W.; Downey, D.F.; Arevalo, E.A. · 2000
[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Junction capacitance reduction by S/D junction compensation implantCurello, C.; Rengarajan, R.; Faul, J.; Kieslich, A.; Glawischnig, H. · 2000
[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - How to monitor a sub-keV USJ implantBayha, B.; Loeffelmacher, D.; Lerch, W.; Downey, D.F.; Arevalo, E.A. · 2000
[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Implant charging dependence on photo resist bake and electron flood gunRomig, T.; King Chao, ; Rendon, M.J.; Azrack, M. · 2000